multiwafer plasma processing reactor — plazminis plokštelių grupinio apdorojimo reaktorius statusas T sritis radioelektronika atitikmenys: angl. multiwafer plasma processing reactor vok. Plasmareaktor für simultane Waferbehandlung, m rus. плазменный реактор для групповой обработки… … Radioelektronikos terminų žodynas
Plasma etching — is a form of plasma processing used to fabricate integrated circuits. It involves a high speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be… … Wikipedia
Plasma stealth — is a proposed process that uses ionized gas (plasma) to reduce the radar cross section (RCS) of an aircraft. Interactions between electromagnetic radiation and ionized gas have been extensively studied for a variety of purposes, including the… … Wikipedia
Plasma source — Plasma sources generate plasmas. Excitation of a plasma requires partial ionization of neutral atoms and/or molecules of a medium. There are several ways to cause ionization:collisions of energetic particles, strong electric fields acting on bond … Wikipedia
Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… … Wikipedia
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Plasma arc waste disposal — Plasma Converter redirects here.Plasma arc gasification is a waste treatment technology that uses high electrical energy and high temperature created by an electrical arc gasifier. This arc breaks down waste primarily into elemental gas and solid … Wikipedia
Plasma nitriding — or ion nitriding (sometimes also called plasma ion nitriding) or glow discharge nitriding, is an industrial surface hardening treatment for metallic materials.DescriptionA plasma is the fourth state of matter, the other three being solid, liquid… … Wikipedia
Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… … Wikipedia
Plasma Spray — Plasma spraying, a method of thermal spraying, is a materials processing technique for producing coatings and free standing parts using a plasma jet. Deposits having thickness from micrometers to several millimeters can be produced from a variety … Wikipedia
