Thallium(III) oxide

Thallium(III) oxide
Thallium(III) oxide
Identifiers
CAS number 1314-32-5
ChemSpider 7979876 YesY
EC number 215-229-3
Properties[1]
Molecular formula Tl2O3
Molar mass 456.76 g/mol
Appearance colourless solid
Density 10.19 g/cm3, solid (22 °C)
Melting point

717 °C (1323 °F)

Boiling point

875 °C decomp.

Solubility in water insoluble
Structure
Crystal structure Cubic, cI80[2]
Space group Ia-3, No. 206
Hazards
EU classification not listed
NFPA 704
NFPA 704.svg
0
4
0
LD50 44 mg/kg
 YesY (verify) (what is: YesY/N?)
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Thallium(III) oxide is a chemical compound of thallium and oxygen. It occurs in nature as the rare mineral avicennite.[3] Its structure is related to that of Mn2O3 which has a bixbyite like structure. Tl2O3 is metallic with high conductivity and is a degenerate n-type semiconductor which may have potential use in solar cells.[4] A method of producing Tl2O3 by MOCVD is known.[5] Any practical use of thallium(III) oxide will always have to take account of thallium's poisonous nature. Contact with moisture and acids may form poisonous thallium compounds.

References

  1. ^ Weast, Robert C., ed (1981). CRC Handbook of Chemistry and Physics (62nd ed.). Boca Raton, FL: CRC Press. p. B156. ISBN 0-8493-0462-8. .
  2. ^ Otto H.H., Baltrasch R., Brandt H.J. (1993). "Further evidence for Tl3+ in Tl-based superconductors from improved bond strength parameters involving new structural data of cubic Tl2O3". Physica C 215 (1-2): 205. doi:10.1016/0921-4534(93)90382-Z. 
  3. ^ http://www.handbookofmineralogy.org/pdfs/avicennite.pdf Handbook of Mineralogy
  4. ^ Phillips R. J., Shane M. J., Switzer J. A. (1989). "Electrochemical and photoelectrochemical deposition of Thallium(III) Oxide thin films". Journal of Materials Research 4 (04): 923. doi:10.1557/JMR.1989.0923. 
  5. ^ D. Berry, R. T. Holm, R. L. Mowery, N. H. Turner, and M. Fatemi (1991). "Thallium(III) Oxide by Organometallic Chemical Vapor Deposition". Chemistry of Materials 3 (1): 72–77. doi:10.1021/cm00013a019. 

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