Chemical bath deposition

The chemical bath deposition method is one of the cheapest methods to deposit thin films and nanomaterials, as it does not depend on expensive equipment and is a scalable technique that can be employed for large area batch processing or continuous deposition. In 1933 Bruckman deposited PbS thin film by chemical bath deposition (CBD) or solution grown method. The major advantage of CBD is that it requires only solution containers and substrate mounting devices. The one drawback of this method is the wastage of solution after every deposition. Among various deposition techniques, chemical bath deposition yields stable, adherent, uniform and hard films with good reproducibility by a relative simpler process. Chemical bath deposition method is one of the suitable methods for preparing highly efficient thin films in a simpler manner. The growth of thin films strongly depends on growth conditions, such as duration of deposition, composition and temperature of the solution, and topographical and chemical nature of the substrate.

Reaction Mechanism

The chemical bath deposition involves two steps, nucleation and particle growth, which is based on the formation of solid phase from a solution. In the chemical bath deposition procedure, the substrate is immersed in an aqueous solution containing the precursors.

References

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1. ^ Chemical Bath Bruckman